Structure and Reactivity of Alkylsiloxane Monolayers Formed by Reaction of Alkyltrichlorosilanes on Silicon Substrates
نویسندگان
چکیده
"iiiit"iii"it""iil"a"pendent oi chain leigth. The presence of small amounts of water was necessarv for t1i6 formation of these films. The alkylsil6xane monolayers were stable in common organic solvent€, wat€r, and scid but were d€6hoyed by prolonged exposure to base. Simple reactions on vinyl-t€rminated monolayeis i"n"r"t"a "t"ohot-, "arb'oxylii: ircid-, ind bromine-terminated iilms whose contact angleswere lower then id;;;iid;;;"Ly; but whose lengths were targely unchanged. Meas_uremenk of .rhe conract angle of acid-teriinated interfaces as a functi-on of pH indiiaied that ionization of the surface-immobilized acids required stronger base than does ionization of soluble carboxylic acids. Monolayers containing-mixtures of inethyl and "carboxyt fnt "tio"aities e*hibitcd wetting properties that minored the composition of the interface.
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Selective atomic layer deposition of titanium oxide on patterned self-assembled monolayers formed by microcontact printing.
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